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US 10,766,769 B2Granted
Semiconductor element and methods for manufacturing the same
AssigneeInfineon Technologies AG
InventorsChristian Bretthauer, Dirk Meinhold
Life of this patent
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Abstract
A semiconductor element includes a processed substrate arrangement including a processed semiconductor substrate and a metallization layer arrangement on a main surface of the processed semiconductor substrate. The semiconductor element further includes a passivation layer arranged at an outer border of the processed substrate arrangement.
Claims17
A semiconductor element comprising:
- a processed substrate arrangement comprising a processed semiconductor substrate and a metallization layer structure on a main surface of the processed semiconductor substrate;
- a passivation layer arranged at an outer border of the processed substrate arrangement;
- a microelectromechanical system (MEMS) functional element arranged at the processed semiconductor substrate;
- and
- a notch formed in the metallization layer structure,
- wherein the passivation layer is deposited such that the MEMS functional element, arranged at the processed semiconductor substrate in the notch, and side wall structures of the notch in the metallization layer structure are covered by the passivation layer, and
- wherein the metallization layer structure includes a kerf at a separation region in the processed semiconductor substrate, the separation region defining a border between a die region of the processed substrate arrangement and at least a second region of the processed substrate arrangement.
4 more elements
A semiconductor element, comprising:
- a processed substrate arrangement comprising a processed semiconductor substrate and a metallization layer structure on a main surface of the processed semiconductor substrate;
- a passivation layer arranged at an outer border of the processed substrate arrangement;
- and
- a microelectromechanical system (MEMS) functional element arranged at the processed semiconductor substrate,
- wherein the metallization layer structure includes a kerf at a separation region in the processed semiconductor substrate, the separation region defining a border between a die region of the processed substrate arrangement and at least a second region of the processed substrate arrangement,
- wherein the MEMS functional element is arranged at the processed semiconductor substrate in the die region,
- wherein the MEMS functional element is released from the metallization layer structure by a notch in the metallization layer structure, and
- wherein the passivation layer is arranged at the outer border of the processed substrate arrangement, at a side wall structure of the notch, and over a surface of the MEMS functional element such that at least a portion of the MEMS functional element is exposed.
5 more elements
A semiconductor element, comprising
- a processed substrate arrangement comprising a processed semiconductor substrate and a metallization layer structure on a main surface of the processed semiconductor substrate;
- a passivation layer arranged at an outer border of the processed substrate arrangement;
- and
- a microelectromechanical system (MEMS) functional element arranged at the processed semiconductor substrate,
- wherein the metallization layer structure includes a kerf at a separation region in the processed semiconductor substrate, the separation region defining a border between a die region of the processed substrate arrangement and at least a second region of the processed substrate arrangement,
- wherein the MEMS functional element is arranged at the processed semiconductor substrate in the die region,
- wherein the MEMS functional element is released from the metallization layer structure by a notch in the metallization layer structure, and
- wherein the passivation layer is arranged at the outer border of the processed substrate arrangement, at a side wall structure of the notch, and over a surface of the MEMS functional element such that the entire surface of the MEMS functional element is covered by the passivation layer.
5 more elements
Dependencies are inferred from the claim text.