Chamber of plasma system, liner for plasma system and method for installing liner to plasma system
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsChung-Hsien Liao, Wen-Pao Tsai
Life of this patent
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Abstract
A chamber of a plasma system includes a chamber wall defining a plasma processing area, a substrate supporter configured to support a substrate in the plasma processing area, and a liner located in the plasma processing area and separating the chamber wall from the plasma processing area. A liner for a plasma system and a method for installing a liner to a plasma system are also provided.
Claims20
A chamber of a plasma system, comprising:
- a lower chamber and an upper chamber defining a plasma processing area;
- a substrate supporter configured to support a substrate in the plasma processing area;
- and
- a liner located in the lower chamber and separating a chamber wall from the plasma processing area, wherein the liner has a side wall and a plurality of bottom tabs, the side wall is a ring surrounding along an inner sidewall of the lower chamber, the plurality of bottom tabs is connected to and extend from a bottom of the side wall toward the substrate supporter, the plurality of bottom tabs are spaced from each other, the liner is fixed to a bottom surface of the chamber wall in the lower chamber by screwing a plurality of first screws through the plurality of bottom tabs, and a topmost surface of the liner is lower than a topmost surface of the lower chamber.
A liner for a plasma system, wherein the plasma system comprises a chamber, the chamber comprises a lower chamber and an upper chamber defining a plasma processing area and a substrate supporter configured to support a substrate in the plasma processing area, the liner located in the lower chamber comprising:
- a liner body;
- and
- an insulating protective layer covering the liner body, for separating a chamber wall from the plasma processing area, wherein the liner has a side wall and a plurality of bottom tabs, the side wall is a ring surrounding along an inner sidewall of the lower chamber, the plurality of bottom tabs is connected to and extend from a bottom of the side wall toward the substrate supporter, the plurality of bottom tabs are spaced from each other, the liner is fixed to a bottom surface of the chamber wall in the lower chamber by screwing a plurality of first screws through the plurality of bottom tabs, and a topmost surface of the liner is lower than a topmost surface of the lower chamber.
A method for installing a liner to a plasma system, wherein the plasma system comprises a chamber, the chamber comprises a lower chamber and an upper chamber defining a plasma processing area and a substrate supporter configured to support a substrate in the plasma processing area, the method comprising:
- disposing the liner into the lower chamber for separating a chamber wall from the plasma processing area, wherein the liner has a side wall and a plurality of bottom tabs, the side wall is a ring surrounding along an inner sidewall of the lower chamber, the plurality of bottom tabs is connected to and extend from a bottom of the side wall toward the substrate supporter, the plurality of bottom tabs are spaced from each other, and a topmost surface of the liner is lower than a topmost surface of the lower chamber;
- and
- screwing a plurality of first screws through the plurality of bottom tabs of the liner to fix the liner onto a bottom surface of the chamber wall until an end of each of the plurality of first screws pushing against the chamber wall.
Dependencies are inferred from the claim text.