Reticle clamping device
AssigneeASML Holding N.V.
InventorsEnrico Zordan, Brandon Adam Evans, Daniel Nathan Burbank, Ankur Ramesh Baheti, Samir A. Nayfeh
Life of this patent
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Abstract
Systems and methods are disclosed that provide a support system in the Z direction for patterning devices that can function under high acceleration and deceleration with minimal effect on travel and hysteresis in the X and Y directions. A reticle clamping system includes a support device and a holding device. The holding device is configured to releasably couple a reticle to the support device. The holding device includes a plurality of burls. The reticle clamping system further includes a metallic support system coupled to the support device. The metallic support system provides a vacuum path from a vacuum channel to the holding device.
Claims20
A reticle clamping system, comprising:
- a support device;
- a holding device configured to releasably couple a reticle to the support device, wherein the holding device comprises a plurality of burls;
- and
- a metallic support system coupled to the support device and configured to provide a vacuum path from a vacuum channel to the holding device,
- wherein the metallic support system comprises a holder and a pillar inserted through the holder and coupled to the holder.
A lithographic apparatus comprising:
- an illumination system configured to illuminate a pattern of a patterning device;
- a projection system configured to project an image of the pattern on to a target portion of a substrate;
- and
- a patterning device clamping system, comprising:
- a support device;
- a holding device configured to releasably couple a patterning device to the support device, wherein the holding device comprises a plurality of burls distributed in two directions;
- and
- a metallic support system coupled to the support device and configured to provide a vacuum path from a vacuum channel to the holding device,
- wherein the metallic support system comprises a holder and a pillar inserted through the holder and coupled to the holder.
A method for supporting a patterning device, the method comprising:
- holding the patterning device using a plurality of burls on a holding device;
- supporting the holding device using a support device;
- and
- providing a vacuum path from a vacuum channel to the holding device through a metallic support system, wherein the metallic support system comprises a holder and a pillar inserted through the holder and coupled to the holder.
Dependencies are inferred from the claim text.