Positive resist film laminate and pattern forming process
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsYoshinori Hirano, Satoshi Asai, Kazunori Kondo
Life of this patent
Estimating the term…
Abstract
A laminate comprising a thermoplastic film and a positive resist film is provided, the positive resist film comprising (A) a novolak resin-naphthoquinone diazide (NQD) base resin composition, (B) a polyester, and (C) 3-30 wt % of an organic solvent. The resist film may be transferred to a stepped support without forming voids.
Claims8
A positive resist film laminate comprising a thermoplastic film as a first support and a novolak resin-naphthoquinone diazide (NQD) base positive resist film thereon,
- said novolak resin-NQD base positive resist film comprising
- (A) a novolak resin-NQD base resin composition,
- (B) a polyester, and
- (C) 3 to 30% by weight of an organic solvent,
- the novolak resin-NQD base resin composition (A) comprising
- (A-1) a novolak resin having phenolic hydroxyl groups wherein some or all hydrogen atoms of the phenolic hydroxyl groups are substituted by 1,2-naphthoquinone diazidosulfonyl groups,
- (A-2) a novolak resin having phenolic hydroxyl groups wherein some or all hydrogen atoms of the phenolic hydroxyl groups are substituted by 1,2-naphthoquinone diazidosulfonyl groups, and a novolak resin having unsubstituted phenolic hydroxyl groups,
- (A-3) a novolak resin having phenolic hydroxyl groups wherein some or all hydrogen atoms of the phenolic hydroxyl groups are substituted by 1,2-naphthoquinone diazidosulfonyl groups, and a 1,2-naphthoquinone diazidosulfonic acid ester,
- (A-4) a novolak resin having phenolic hydroxyl groups wherein some or all hydrogen atoms of the phenolic hydroxyl groups are substituted by 1,2-naphthoquinone diazidosulfonyl groups, a novolak resin having unsubstituted phenolic hydroxyl groups, and a 1,2-naphthoquinone diazidosulfonic acid ester, or
- (A-5) a novolak resin having unsubstituted phenolic hydroxyl groups and a 1,2-naphthoquinone diazidosulfonic acid ester,
- wherein the polyester (B) is a condensate of a polyfunctional carboxylic acid with a polyhydric alcohol or a condensate of a polyfunctional carboxylic anhydride with a polyhydric alcohol.
A positive resist film laminate comprising a thermoplastic film as a first support and a novolak resin-naphthoquinone diazide (NQD) base positive resist film thereon,
- said novolak resin-NQD base positive resist film comprising
- (A) a novolak resin-NQD base resin composition,
- (B) a polyester, and
- (C) 3 to 30% by weight of an organic solvent,
- the novolak resin-NQD base resin composition (A) comprising
- (A-1) a novolak resin having phenolic hydroxyl groups wherein some or all hydrogen atoms of the phenolic hydroxyl groups are substituted by 1,2-naphthoquinone diazidosulfonyl groups,
- (A-2) a novolak resin having phenolic hydroxyl groups wherein some or all hydrogen atoms of the phenolic hydroxyl groups are substituted by 1,2-naphthoquinone diazidosulfonyl groups, and a novolak resin having unsubstituted phenolic hydroxyl groups,
- (A-3) a novolak resin having phenolic hydroxyl groups wherein some or all hydrogen atoms of the phenolic hydroxyl groups are substituted by 1,2-naphthoquinone diazidosulfonyl groups, and a 1,2-naphthoquinone diazidosulfonic acid ester,
- (A-4) a novolak resin having phenolic hydroxyl groups wherein some or all hydrogen atoms of the phenolic hydroxyl groups are substituted by 1,2-naphthoquinone diazidosulfonyl groups, a novolak resin having unsubstituted phenolic hydroxyl groups, and a 1,2-naphthoquinone diazidosulfonic acid ester, or
- (A-5) a novolak resin having unsubstituted phenolic hydroxyl groups and a 1,2-naphthoquinone diazidosulfonic acid ester,
- wherein the polyester (B) is alkali soluble.
Dependencies are inferred from the claim text.