Asymmetric overlay mark for overlay measurement
AssigneeGlobalfoundries Inc.
InventorsWei Zhao, Minghao Tang, Rui Chen, Dongyue Yang, Haiting Wang, Erik Geiss, Scott Beasor
Life of this patent
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AssigneeGlobalfoundries Inc.
InventorsWei Zhao, Minghao Tang, Rui Chen, Dongyue Yang, Haiting Wang, Erik Geiss, Scott Beasor
Estimating the term…
One illustrative example of an overlay mark disclosed herein includes four quadrants (I-IV). Each quadrant of the mark contains an inner periodic structure and an outer periodic structure. Each of the outer periodic structures includes a plurality of outer features. Each of the inner periodic structures includes a plurality of first inner groups, each of the first inner groups having a plurality of first inner features, each first inner group being oriented such that there is an end-to-end spacing relationship between each first inner group and a selected one of the outer features.
An overlay mark comprising four quadrants referenced with numerals I, II, III and IV respectively, said overlay mark comprising:
The overlay mark of 1, wherein said inner periodic structures in quadrants II and IV are positioned asymmetrically relative to said first centerline and to a center of said overlay mark, and said inner periodic structures in quadrants I and III are positioned asymmetrically relative to said second centerline and to said center of said overlay mark.
An overlay mark comprising four quadrants that will be referenced with numerals I, II, III and IV respectively, said overlay mark comprising:
Dependencies are inferred from the claim text.