Method for polishing a semiconductor wafer
AssigneeSiltronic AG
InventorsJuergen Schwandner, Michael Kerstan
Life of this patent
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Abstract
A method of polishing a semiconductor wafer includes polishing a surface of the semiconductor wafer using a polishing pad while supplying a polishing agent slurry containing abrasives during a first step. The polishing pad is free of abrasives and includes a first surface that contacts the semiconductor wafer, the first surface having a surface structure including elevations. Supply of polishing agent slurry is subsequently ended and, in a second step, the surface of the semiconductor wafer is polished using the polishing pad while supplying a polishing agent solution having a pH value of at least 12 that is free of solids.
Claims20
A method of polishing a semiconductor wafer, the method comprising:
- polishing a surface of the semiconductor wafer using a polishing pad while supplying a polishing agent slurry containing abrasives during a first step, the polishing pad being free of abrasives and including a first surface that contacts the semiconductor wafer, the first surface having a surface structure including elevations, the structure of the first surface being structured by one of chemical etching, grinding, buffing, sintering or furrowing;
- subsequently ending the supply of polishing agent slurry;
- and
- polishing the surface of the semiconductor wafer so as to decrease a surface roughness of the wafer using the polishing pad in a second step while supplying a polishing agent solution having a pH value of at least 12 that is free of solids.
Dependencies are inferred from the claim text.