Lithographic apparatus

A device manufacturing method, comprising:

• supplying a liquid to a space between a projection system and a substrate;
• projecting a radiation beam through the liquid onto the substrate;
• and
• exhausting at least part of the liquid from the space using an extractor opening defined in an exterior surface of a fluid handling structure located above the substrate, the extractor opening having at least a portion at the exterior surface that is curved with a finite radius of curvature such that the curvature extends in an imaginary plane that is perpendicular to a surface of the substrate and/or the substrate table facing the fluid handling structure and that intersects with the portion and such that a distance between the curved portion of the extractor opening and the surface of the substrate and/or the substrate table increases from an innermost position, relative to a center of the fluid handling structure, of the curved portion to an outermost position, relative to the center of the fluid handling structure, of the curved portion.