Vaporizer and thin film deposition apparatus including the same

A vaporizer comprising:

• a main body comprising:
• a first body including an upper portion narrowing in a first direction;
• a second body including a cavity accommodating the upper portion of the first body and an inner surface facing the upper portion of the first body;
• and
• a mixing chamber between the first body and the second body the mixing chamber including a space between the upr portion of the first body and the inner surface of the second body;
• and
• a valve unit connected to the first body,
• wherein the first body is movably combined with the second body,
• wherein the second body comprises:
• a carrier gas injection path connected to a carrier gas inlet formed in an upper portion of the mixing chamber, wherein the carrier gas injection path carries a carrier gas;
• a source material injection path connected to a source material inlet formed in the mixing chamber, wherein the source material injection path carries a liquid source material;
• and
• a discharge path connected to an outlet formed in a lower portion of the mixing chamber, wherein a mixed fluid including the carrier gas and the liquid source material is discharged through the discharge path, and
• wherein the valve unit is configured to move the first body to open or close the carrier gas inlet and the source material inlet at substantially the same time.

A thin film deposition apparatus comprising:

• a chamber;
• and
• a vaporizer configured to supply a vaporized source material to the chamber,
• wherein the vaporizer comprises:
• a first body including an upper portion narrowing in a first direction of the first body;
• a second body including a cavity accommodating the upper portion of the first body and an inner surface facing the upper portion of the first body;
• and
• a mixing chamber between the first body and the second body, the mixing chamber including a space between the upper portion of the first body and the inner surface of the second body,
• wherein the second body comprises:
• a carrier gas injection path connected to a carrier gas inlet formed in an upper portion of the mixing chamber, wherein the carrier gas injection path carries a carrier gas;
• a source material injection path connected to a source material inlet formed in the mixing chamber, wherein the source material injection path carries a liquid source material;
• and
• a discharge path connected to an outlet formed in a lower portion of the mixing chamber, wherein a mixed fluid including the carrier gas and the liquid source material is discharged through the discharge path.