Lithographic apparatus, support table for a lithographic apparatus and device manufacturing method

A support table, for a lithographic apparatus, configured to support a substrate in a recess, the support table comprising:

• a support section configured to support a lower surface of a substrate on an upper face thereof, the substrate having a peripheral edge extending upward from the lower surface;
• a conditioning system configured to supply heat energy to and/or remove heat energy from the support section, the conditioning system comprising a plurality of conditioning units that are independently controllable, each of the conditioning units configured to supply heat energy to and/or remove heat energy from a respective conditioning region of the support section;
• and
• an extraction system configured to extract immersion liquid from a gap extending between an upwardly extending side of the recess and the peripheral edge of the substrate when supported on the support table, the extraction system comprising a plurality of outlets that are independently controlled to perform an extraction process, each outlet configured to extract immersion liquid at a respective different location along the peripheral edge of the substrate.