Resist composition
AssigneeSumitomo Chemical Company, Limited
InventorsYuki Suzuki, Yuichi Mukai, Koji Ichikawa
Life of this patent
Estimating the term…
Loading patent…
AssigneeSumitomo Chemical Company, Limited
InventorsYuki Suzuki, Yuichi Mukai, Koji Ichikawa
Estimating the term…
A resist composition which contains a resin (A1) which has a structural unit represented by formula (I), a structural unit represented by formula (II) and a structural unit having an acid-labile group, and an acid generator: wherein R1 and R2 independently represent a hydrogen atom, a halogen atom or a C1-6 alkyl group that may have a halogen atom, Ra25 represents a carboxy group, a cyano group or a C1-4 aliphatic hydrocarbon group, A1 represents a single bond, *-A2-O—, *-A2-CO—O—, etc., A2 and A3 independently represents a C1-6 alkanediyl group, and w1 represents an integer of 0 to 8, L1 represents a single bond or *-L2-CO—O-(L3-CO—O)g—, L2 and L3 independently represent a C1-12 divalent hydrocarbon group, g represent 0 or 1, R3 represents a C1-12 liner or branched alkyl group except for a tertiary alkyl group and * represents a binding position to an oxygen atom.
A resist composition comprising
Dependencies are inferred from the claim text.