Array substrate and method for manufacturing the same, display apparatus

A method for manufacturing an array substrate, the method comprising:

• forming a metal-oxide semiconductor layer, a first conductive layer and a second conductive layer sequentially on a substrate;
• and
• treating the metal-oxide semiconductor layer, the first conductive layer and the second conductive layer in a single patterning process using a mask, to form an active layer, pixel electrodes, a source drain pattern layer which comprises source electrodes, drain electrodes and data lines, and a reserved pattern of the first conductive layer which is provided in a same layer as the pixel electrodes and formed on sides of the source electrodes and the data lines close to the active layer, wherein,
• a drain electrode of the drain electrodes is in direct contact with a corresponding pixel electrode of the pixel electrodes, and a partial region of the pixel electrode is unobstructed from the drain electrode.