Electrostatic discharge protection device and method for forming the same

A method for forming an electrostatic discharge (ESD) protection device, comprising:

• providing a substrate including an input region;
• forming a plurality of fins on the substrate in the input region;
• forming an insulating layer on the substrate, the insulating layer covering a portion of a sidewall of a fin, a top surface of the insulating layer being lower than the top surfaces of the plurality of fins;
• forming a well region, doped with first-type ions, in the plurality of fins and in the substrate;
• forming an epitaxial layer on each fin in the input region, wherein a process to form the epitaxial layer includes:
• forming a barrier layer on the insulating layer and the sidewall of the fin, the barrier layer exposing a portion of the top surface of the fin;
• and
• using the barrier layer as a mask to perform a selective epitaxial deposition process on the top surface of the fin to form the epitaxial layer;
• forming a drain region, doped with second-type ions, in a top portion of each fin and in the epitaxial layer;
• forming an extended drain region, doped with the second-type ions, in a bottom portion of each fin to connect to the drain region and in a portion of the substrate, in the input region;
• and
• forming a counter-doped region, doped with the first-type ions, in a portion of the substrate between two adjacent fins to insulate adjacent extended drain regions.