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US 10,504,773 B2Granted
Fluorimetry systems
AssigneeMicron Technology, Inc.
InventorDavid H. Wells
Life of this patent
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Abstract
Some embodiments include methods of forming voids within semiconductor constructions. In some embodiments the voids may be utilized as microstructures for distributing coolant, for guiding electromagnetic radiation, or for separation and/or characterization of materials. Some embodiments include constructions having micro-structures therein which correspond to voids, conduits, insulative structures, semiconductor structures or conductive structures.
Claims7
A fluorimetry system, comprising:
- a sample holder comprising:
- a silicon-containing substrate;
- a pair of silicon dioxide-containing projections extending upwardly from the substrate;
- a silicon dioxide-containing cover extending across the projections;
- the substrate, projections and cover together encompassing a sample-retaining conduit;
- a source of electromagnetic radiation configured to emit radiation through either the substrate, projections or the cover;
- and
- a detector configured to detect electromagnetic radiation passing out of the sample-retaining conduit, the detector being configured to detect radiation at about 90 degrees relative to a direction along which the source emits radiation.
5 more elements
Dependencies are inferred from the claim text.