Substrate processing apparatus and method of adjusting substrate processing apparatus

A substrate processing apparatus comprising:

• a plurality of heating modules each including a table on which a substrate is placed to be heated, the substrate having a plurality of heated zones, the table having a plurality of heaters each assigned to heat respective ones of the heated zones, wherein heat generation of the heaters can be controlled independently from each other;
• and
• a control unit that outputs control signals that controls the heaters such that integrated quantities of heat of the respective heated zones given by the corresponding heaters from a first time point to a second time point are substantially identical to each other in each of the heating modules, and are substantially identical to each other among the heating modules, the control unit including a target value outputting unit transmitting a signal for a target value of a temperature of each of the respective ones of the heated zones and at least one offset value outputting unit transmitting a signal for an offset value of the temperature with respect to each of the target values;
• wherein the first time point is a time point at which a temperature transition profile of the substrate is rising toward a process temperature after the substrate is placed on the table under a condition where heat generation of the heaters are stable, and the second time point is a time point after the temperature transition profile reaches the process temperature,
• wherein the offset value is a difference between one of the integrated quantities of heat in the respective heated zones from the first time point to the second time point and a reference value of the one of the integrated quantities of heat from the first time point to the second time point.