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US 10,504,726 B2Granted
Nano-scale structures
AssigneeSK hynix Inc.
InventorsKeun Do Ban, Jung Gun Heo, Cheol Kyu Bok, Myoung Soo Kim
Life of this patent
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Abstract
A nanoscale structure includes an array of pillars over an underlying layer, a separation wall layer including first separation walls formed over sidewalls of the pillars, and a block co-polymer (BCP) layer formed over the separation wall layer and filling gaps between the pillars. The BCP layer is phase-separated to include first domains that provide second separation walls formed over the first separation walls and second domains that are separated from each other by the first domains.
Claims4
A nanoscale structure comprising:
- an array of first separation walls over an underlying layer, each of the first separation walls having a hollow cylindrical shape;
- and
- a block co-polymer (BCP) layer formed over inner sidewalls and outer sidewalls of the first separation walls,
- wherein the BCP layer includes first domains that provide second separation walls formed over the inner sidewalls and the outer sidewalls of the first separation walls and second domains that are phase separated from each other by the first domains.
1 more element
Dependencies are inferred from the claim text.