Plasma treatment apparatus
AssigneeIndustrial Technology Research Institute
InventorHung-Yuan Hsieh
Life of this patent
Estimating the term…
Loading patent…
AssigneeIndustrial Technology Research Institute
InventorHung-Yuan Hsieh
Estimating the term…
A plasma treatment apparatus and a plasma treatment method are provided. The apparatus includes a chamber, a planar plasma-generating electrode, a sample suspension and holding system, and an optical observation system. The chamber defines a processing inner chamber, and the top portion of the chamber has a window. The planar plasma-generating electrode is located in the processing inner chamber for generating a planar plasma. The sample suspension and holding system is disposed opposite to the planar plasma-generating electrode in the processing inner chamber to suspend and hold a sample. The optical observation system is located in the processing inner chamber adjacent to the sample suspension and holding system to measure the thickness range of a planar plasma effective influence region through the window of the chamber.
A plasma treatment apparatus, comprising:
Dependencies are inferred from the claim text.