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AssigneeNuFlare Technology, Inc.
InventorsMunehiro Ogasawara, Takanao Touya
Estimating the term…
A charged particle beam writing method includes forming an aperture image by making a charged particle beam pass through an aperture substrate, changing, in the state where a plurality of crossover positions of the charged particle beam and positions of all of one or more intermediate images of the aperture image are adjusted to matching positions with respect to the aperture image with the first magnification, magnification of the aperture image from the first magnification to the second magnification by using a plurality of lenses while maintaining the last crossover position of the charged particle beam and the position of the last intermediate image of the aperture image to be fixed, and forming, using an objective lens, the aperture image whose magnification has been changed to the second magnification on the surface of the target object, and writing the aperture image.
A charged particle beam writing method comprising:
A charged particle beam writing apparatus comprising:
Dependencies are inferred from the claim text.