Device and method for forming a plurality of charged particle beamlets
AssigneeICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
InventorJürgen Frosien
Life of this patent
Estimating the term…
Loading patent…
AssigneeICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
InventorJürgen Frosien
Estimating the term…
Disclosed herein is charged particle beam device and a a method of operating a charged particle beam device, comprising forming a plurality of focused charged particle beamlets. Charged particles are directed from a charged particle source to a multi-aperture plate. A plurality of beamlets are passed through a plurality of apertures of the multi-aperture plate. The beamlets include an inner beamlet of charged particles and a plurality of outer beamlets of charged particles. The outer beamlets are focused to form a plurality of outer focal points on a virtual ring having a center along an optical axis, the outer beamlets subjected to a field curvature aberration, such that the virtual ring is axially displaced relative to a virtual focal point of an uncompensated inner beamlet. A compensated inner beamlet is focused to a compensated focal point. The inner beamlet is compensated to form the compensated inner beamlet; and the compensated focal point is coplanar with the virtual ring.
A method of operating a charged particle beam device, comprising;
A charged particle beam device comprising:
A charged particle beam device comprising:
Dependencies are inferred from the claim text.