Conductive beam optic containing internal heating element

An ion implantation system, comprising:

• an electrostatic filter for delivering an ion beam to a wafer, the electrostatic filter comprising:
• a housing having an exit proximate the wafer;
• and
• a plurality of conductive beam optics within the housing, the plurality of conductive beam optics arranged around an ion beam-line, and the plurality of conductive beam optics comprising:
• a set of entrance aperture electrodes proximate an entrance aperture of the housing;
• a set of energetic electrodes downstream along the ion beam-line from the set of entrance aperture electrodes;
• and
• a set of ground electrodes downstream along the ion beam-line of the set of energetic electrodes, wherein the set of energetic electrodes is positioned farther away from the ion beam-line than the set of entrance aperture electrodes and the set of ground electrodes, wherein at least one of the plurality of conductive beam optics includes an internal heating element, and wherein the internal heating element comprises a heating lamp surrounded by a hollow shell;
• and
• an electrical system in communication with the electrostatic filter, the electrical system configured to supply a voltage and a current to the plurality of conductive beam optics.

A conductive beam optic, comprising:

• a heating lamp;
• a hollow shell concentrically disposed about the heating lamp, the hollow shell extending along an entire length of the heating lamp;
• and
• a conductor electrically connected with the heating lamp.