Generation of a map of a substrate using iterative calculations of non-measured attribute data
AssigneeTokyo Electron Limited
InventorsDaniel Morvay, Taejoon Han
Life of this patent
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Abstract
Described herein are technologies to facilitate the generation and presentation of a map of an attribute of a substrate, such as a semiconductor wafer. Using the data of measured attribute (e.g., thickness, temperature, etc.) of a substrate, one or more of the described implementations generate data of non-measured (i.e., calculated) attributes to complete a map of the substrate using model parameters and a correlations model, such as a squared exponential Gaussian process model.
Claims17
A method that facilitates generation of map of an attribute of a substrate, the method comprising:
- obtaining measured attribute data of a substrate, the measured attribute data representing measured attributes of the substrate, and including measurements of locations outside a periphery of the substrate;
- determining model parameters of a correlation model;
- processing the measured attribute data to generate the correlation model;
- iteratively calculating non-measured attribute data of the substrate, wherein the non-measured attribute data of the substrate represents attributes of the substrate that are calculated based on the correlation model and the model parameters, and includes calculations of locations outside the periphery of the substrate;
- presenting a map of the substrate for viewing by a user, the map including the measured and non-measured attribute data.
One or more computer-readable media storing instructions thereon that, when executed by one or more processors, direct the one or more processors to perform operations that facilitate generation of map of an attribute of a substrate, the operations comprising:
- obtaining measured attribute data of a substrate, the measured attribute data representing measured attributes of the substrate, and including measurements of locations outside a periphery of the substrate;
- determining model parameters of a correlation model;
- processing the measured attribute data to generate the correlation model;
- iteratively calculating non-measured attribute data of the substrate, wherein the non-measured attribute data of the substrate represents attributes of the substrate that are calculated based on the correlation model and the model parameters, and includes calculations of locations outside the periphery of the substrate;
- presenting a map of the substrate for viewing by a user, the map including the measured and non-measured attribute data.
A method that facilitates generation of map of an attribute of a substrate, the method comprising:
- obtaining measured attribute data of a substrate, the measured attribute data representing measured attributes of the substrate, and including measurements of locations outside a periphery of the substrate;
- determining model parameters of a correlation model, the correlation model being a squared exponential Gaussian process model;
- processing the measured attribute data to generate the correlation model;
- iteratively calculating non-measured attribute data of the substrate, wherein the non-measured attribute data of the substrate represents attributes of the substrate that are calculated based on the squared exponential Gaussian process model and the model parameters, and includes calculations of locations outside the periphery of the substrate;
- determining calculation errors with each iteration of the iterative calculations, wherein the iterative calculations are performed until the calculation errors fall within specified error range;
- presenting a map of the substrate for viewing by a user, the map including the measured and non-measured attribute data.
Dependencies are inferred from the claim text.