Method for manufacturing color filter substrate

A method for manufacturing a color filter substrate, comprising:

• a step S10 of providing a substrate;
• a step S20 of forming a plurality of RGB color resists on the substrate, wherein each of the RGB color resists comprises at least four color resist regions arranged in an array, each of the color resist regions comprises a first color resist block, a second color resist block, and a third color resist block distributed in sequence, an upper surface of each of the RGB color resists comprises a plurality of light emitting regions, wherein the first color resist block is a red color resist block, the second color resist block is a green color resist block, the third color resist block is a blue color resist block;
• a step S30 of forming a black matrix on the surface of each of the RGB color resists, wherein the black matrix covers a portion of the surface of each of the RGB color resists except the light emitting regions;
• a step S40 of forming a plurality of photo spacers on a surface of the black matrix in a plurality of empty areas within each of the RGB color resists, wherein the adjacent photo spacers are separated by one of the color resist regions;
• and
• a step S50 of forming a protective layer over the substrate, wherein the protective layer fully covers the black matrix, the photo spacers, and the RGB color resists;
• wherein a complementary arrangement of the photo spacers combined with the black matrix is configured to prevent light emitted from the RGB color resists from being mixed.