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US 10,503,062 B2Granted
Multi-tone amplitude photomask
AssigneeMarsupial Holdings, Inc.
InventorsWilliam P. Parker, Julie Parker
Life of this patent
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Abstract
A method of fabricating a multi-tone amplitude photomask includes providing a mask substrate. The method includes providing a stepped pattern in at least one layer of material on a surface of the mask substrate. The stepped pattern includes at least two steps and at least three levels. Each level of the stepped pattern provides a different intensity of light when a light source shines light on the stepped pattern.
Claims20
A method of fabricating a multi-tone amplitude photomask, comprising
- a. providing a mask substrate;
- and
- b. providing a pattern on a surface of the mask substrate, wherein the pattern defines a channel and includes at least three layers of material, wherein each layer of material provides a different intensity of light when a light source shines light on the pattern.
A method of fabricating a multi-tone amplitude photomask comprising:
- a. providing a mask substrate;
- and
- b. providing a channel on top of the substrate, wherein the channel is formed from a plurality of layers of material, wherein each layer has an optical density that depends on the material characteristic and layer thickness.
Dependencies are inferred from the claim text.