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US 10,502,894 B2Granted
Method of making a metal grating in a waveguide and device formed
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsJui Hsieh Lai, Ying-Hao Kuo
Life of this patent
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Abstract
A method of making a grating in a waveguide includes forming a waveguide material over a substrate, the waveguide material having a thickness less than or equal to about 100 nanometers (nm). The method further includes forming a photoresist over the waveguide material and patterning the photoresist. The method further includes forming a first set of openings in the waveguide material through the patterned substrate and filling the first set of openings with a metal material.
Claims20
A waveguide structure comprising:
- a substrate;
- a dielectric layer over the substrate, the dielectric layer comprising a light-transmissive material, the dielectric layer having a first surface facing towards the substrate and a second surface facing away from the substrate;
- a plurality of first metal features extending from the first surface of the dielectric layer to the second surface of the dielectric layer, the first metal features having a first pitch;
- and
- a plurality of second metal features extending from the first surface of the dielectric layer to the second surface of the dielectric layer, the second metal features having a second pitch, the second pitch being different from the first pitch, top surfaces of the first metal features being planar with top surfaces of the second metal features,
- wherein the substrate, the dielectric layer, the first metal features, and the second metal features form the waveguide structure.
3 more elements
A waveguide structure comprising:
- a substrate;
- a dielectric layer over the substrate, the dielectric layer comprising a light-transmissive material;
- and
- a plurality of metal features extending into the dielectric layer from a top surface of the dielectric layer by a first distance,
- wherein a first subset of the metal features repeat with a first period, a second subset of the metal features repeat with a second period, and the second period is less than the first period,
- wherein the first subset of the metal features are adjacent one another, and the second subset of the metal features are adjacent one another,
- wherein top surfaces of the first subset and the second subset of the metal features are planar with the top surface of the dielectric layer, and
- wherein the substrate, the dielectric layer, and the metal features form the waveguide structure.
5 more elements
A waveguide structure comprising:
- a substrate;
- a dielectric layer over the substrate, the dielectric layer comprising a light-transmissive material, the dielectric layer having a first longitudinal section, a second longitudinal section, and a third longitudinal section;
- a plurality of first metal features extending from a first surface of the dielectric layer to a second surface of the dielectric layer, the first metal features being disposed at a junction of the first and second longitudinal sections of the dielectric layer;
- and
- a plurality of second metal features extending from the first surface of the dielectric layer to the second surface of the dielectric layer, the second metal features being disposed at a junction of the second and third longitudinal sections of the dielectric layer, the first metal features and the second metal features having different pitches,
- wherein bottom surfaces of each of the first metal features and the second metal features are disposed a same distance from the substrate.
3 more elements
Dependencies are inferred from the claim text.