Method for examining object properties of an object in a substrate

Abstract

A method for examining object properties of an object in a substrate, using an arrangement that comprises a detector device, a localization device, and a control device is provided. The method includes selecting a first object having first object properties to be examined and first target coordinates and also includes determining an actual position of the detector device using the localization device. Moreover, the method includes determining by the control device an actual detection field from the actual position of the detector device, and comparing by the control device the first target coordinates with the actual detection field of the detector device.

Dependencies are inferred from the claim text.