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US 10,501,866 B2Granted
Gas distribution apparatus for improved film uniformity in an epitaxial system
AssigneeASM IP Holding B.V.
InventorsStephen Dale Coomer, Robert Vyne, Timo Bergman, Lee Bode, Wentao Wang
Life of this patent
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Abstract
A gas distribution system is disclosed in order to obtain better film uniformity on a wafer. The better film uniformity may be achieved by utilizing an expansion plenum and a plurality of, for example, proportioning valves to ensure an equalized pressure or flow along each gas line disposed above the wafer.
Claims18
A reaction system for processing a substrate, comprising:
- a reaction chamber, the reaction chamber holding a wafer to be processed;
- a gas source;
- an inlet gas feed line having a first diameter and configured to receive a gas from the gas source;
- a pair of symmetrical feeds, the symmetrical feeds configured to split a flow of the gas from the inlet gas feed line;
- an expansion plenum having a second diameter greater than the first diameter and a plurality of outlet ports, wherein the expansion plenum receives gas from the pair of symmetrical feeds;
- and
- a plurality of valves interposed between the expansion plenum and the reaction chamber, the plurality of valves configured to control flow of the gas from the plurality of outlet ports into the reaction chamber;
- and
- wherein the plurality of valves maintains a substantially equalized pressure across the plurality of outlet ports.
6 more elements
A gas manifold system, comprising:
- an inlet gas feed line configured to receive a gas from a gas source;
- a pair of symmetrical feeds, the symmetrical feeds having a first diameter and configured to split a flow of the gas from the inlet gas feed line;
- an expansion plenum having a second diameter greater than the first diameter and a plurality of outlet ports, wherein the expansion plenum receives gas from the pair of symmetrical feeds;
- and
- a plurality of valves interposed between the expansion plenum and the reaction chamber, the plurality of valves configured to control flow of the gas through the plurality of outlet ports of the expansion plenum;
- and
- wherein the plurality of valves maintains a substantially equalized pressure across the plurality of outlet ports.
4 more elements
Dependencies are inferred from the claim text.