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US 10,501,853 B2Granted
Etchant composition, method for etching multilayered film, and method for preparing display device
AssigneesSamyoung Pure Chemicals Co., Ltd., Mitsubishi Gas Chemical Company, Inc., Samsung Display Co., Ltd.
InventorsJung-Ig Jeon, Chi-Sung Ihn, Mi-Soon Lee, Hyun-Eok Shin, Joon-Woo Bae
Life of this patent
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Abstract
Embodiments provide an etchant composition including (A) a copper ion source, (B) a source of an organic acid ion having one or more carboxyl groups in a molecule, (C) a fluoride ion source, (D) an etching controller, a surface oxidizing power enhancer or a combination thereof as a first additive, and (E) a surfactant as a second additive; a method for etching a multilayered film; and a method for preparing a display device.
Claims19
An etchant composition, comprising:
- (A) a copper ion source;
- (B) a source of an organic acid ion having one or more carboxyl groups in a molecule;
- (C) a fluoride ion source;
- (D) an etching controller, a surface oxidizing power enhancer, or a combination thereof, as a first additive;
- and
- (E) a surfactant, as a second additive,
- wherein the etchant composition has a pH value of 3 or less.
4 more elements
Dependencies are inferred from the claim text.