Composition for optical imprint and method for producing pattern using the same
AssigneeTokyo Ohka Kogyo Co., Ltd.
InventorAtsushi Murota
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AssigneeTokyo Ohka Kogyo Co., Ltd.
InventorAtsushi Murota
Estimating the term…
A composition for optical imprint having excellent transferability of a mold shape and giving a pattern having excellent alkali resistance at high temperature by optical imprint and subsequent heating and a method for producing a pattern using the composition. The composition includes a polysiloxane including a structural unit 1 represented by Formula (a1) and a structural unit 2 represented by Formula (a2) and a polymerization initiator. The polysiloxane has a structural unit 1 content of 30% to 85% by mole and a structural unit 2 content of 15% to 70% by mole based on the entire structural units in the polysiloxane. In the formulae, R1 represents a group containing an ethylenic double bond, and R2 represents an aryl group having 6 to 15 carbon atoms which may have a substituent.
A composition for optical imprint comprising:
Dependencies are inferred from the claim text.