Method for producing photo-structurable glass bodies by a redrawing method

A method for production of a photo-structurable glass element, comprising the steps of:

• a. fixing a blank of photo-structurable glass at a first end;
• b. heating of a deformation zone of the blank;
• c. drawing the blank;
• and
• d. subsequent to either step b. or step c., a sensitization step comprising cooling the blank from a first temperature to a second temperature with an average cooling rate K of at most 200° C./h, wherein the first temperature is at least above a glass transition temperature of the photo-structurable glass and the second temperature is at least 150° C. below the first temperature,
• wherein the glass comprises Si4+, a crystal-agonist, a crystal-antagonist, and a pair of nucleating agents,
• wherein the crystal-agonist is selected from the group consisting of Na+, K+, Li+, and any combinations thereof,
• wherein the crystal-antagonist is selected from the group consisting of Al3+, B3+, Zn2+, Sn2+, Sb3+, and any combinations thereof,
• wherein the pair of nucleating agents comprises cerium and an agent selected from the group consisting of silver, gold, copper, and any combinations thereof, and
• wherein the crystal-agonist has a molar proportion cat.-% in relation to a molar proportion of Si4+ that is at least 0.3 and at most 0.85,
• wherein lithium with regard to the molar proportion exceeds the proportions of the components sodium and potassium in the glass, and
• wherein the glass has a transmittance value of the at least 0.2% at a wavelength of 260 nm and a sample thickness of 1 mm after the sensitization step.