System and method for maintaining a smoothed and anti-stiction surface on a MEMS device

A method of manufacturing a Microelectromechanical system (MEMS) device, comprising:

• providing a sacrificial layer on a substrate;
• epitaxially growing a cap layer over the sacrificial layer;
• forming at least one access opening through the cap layer;
• forming an etched structure in a portion of the sacrificial layer through the at least one access opening;
• depositing a first barrier layer portion on a first cap portion of the cap layer, the first cap portion defining the at least one access opening;
• depositing a second barrier layer portion on a second cap portion of the cap layer, the second cap portion defining a lateral wall of the etched structure;
• and
• epitaxially growing a refill material on a portion of the first barrier portion to seal the at least one access opening.

A Microelectromechanical system (MEMS) device, comprising:

• a substrate;
• a first layer on the substrate, the first layer including a lateral wall defining a gap region in the first layer;
• a second layer disposed over the first layer, the second layer including:
• a support structure disposed on the substrate in a portion of the gap region;
• and
• a cap portion supported by the support structure over the gap region so as to define a cavity between the cap portion and the substrate, the cap portion having at least one access opening that extends upwards from the cavity;
• a barrier material coated onto surfaces of the substrate that define the cavity, onto surfaces of the support structure that define the cavity, and onto surfaces of the cap portion that define the at least one access opening;
• and
• a refill material disposed on a portion of the barrier material coated onto the surfaces of the cap portion so as to seal closed the at least one access opening within the cap portion.