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US 10,483,426 B2Granted
Photo cell devices for phase-sensitive detection of light signals
AssigneeInfineon Technologies AG
InventorThoralf Kautzsch
Life of this patent
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Abstract
Embodiments relate to photo cell devices. In one embodiment, a trench-based photo cells provides very fast capture of photo-generated charge carriers, particularly when compared with conventional approaches, as the trenches of the photo cells create depleted regions deep within the bulk of the substrate that avoid the time-consuming diffusion of carriers.
Claims6
A method comprising:
- providing a first vertical trench in a substrate;
- and
- providing a second vertical trench in the substrate laterally disposed from the first vertical trench, wherein a horizontal extent of the first and second vertical trenches extend in a first direction such that the first and second vertical trenches run in the first direction parallel to one another;
- providing a third vertical trench in the substrate;
- providing a fourth vertical trench in the substrate laterally disposed from the third vertical trench, wherein a horizontal extent of the third and fourth vertical trenches extend in a second direction generally perpendicular to the first direction, such that the third and fourth vertical trenches run in the second direction parallel to one another,
- wherein the first vertical trench, the second vertical trench, the third vertical trench and the fourth vertical trench collectively substantially enclose and thus define a square region of the substrate therebetween;
- alternately depleting a first region of the substrate surrounding the first vertical trench and a second region of the substrate surrounding the second vertical trench by alternately applying a voltage to a first vertical trench gate contact and a second vertical trench gate contact, and
- alternately depleting a third region of the substrate surrounding the third vertical trench and a fourth region of the substrate surrounding the fourth vertical trench by alternately applying a voltage to a third vertical trench gate contact and a fourth vertical trench gate contact,
- wherein the alternate depleting of the first, second, third and fourth regions comprising an interleaved biasing resulting in biasing of the various trenches serially in a circular fashion,
- wherein a lateral distance separating the first vertical trench and the second vertical trench is related to a doping level of the substrate such that upon operation a biasing of one of the first vertical trench, the second vertical trench, the third vertical trench and the fourth vertical trench results in formation of a fully depleted gap in a region centrally located between the first vertical trench, the second vertical trench, the third vertical trench, and the fourth vertical trench.
7 more elements
Dependencies are inferred from the claim text.