Electronic device including transistor and method for fabricating the same

Abstract

A method for fabricating an electronic device is provided to include: forming a hard mask pattern over a substrate to expose a gate formation region; forming a gate trench by etching the substrate using the hard mask pattern; forming a gate insulating layer over an inner wall of the gate trench; forming a gate electrode filling a lower portion of the gate trench in which the gate insulating layer is formed; forming an insulating material covering a resultant structure in which the gate electrode is formed; forming a gate protective layer having a top surface lower than a bottom surface of the hard mask pattern; removing the hard mask pattern; recessing the substrate so that a top surface of the substrate is lower than the top surface of the gate protective layer; and forming a conductive pattern filling a space formed by the recessing of the substrate.

Dependencies are inferred from the claim text.