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US 10,483,141 B2Granted
Semiconductor process equipment
AssigneeApplied Materials, Inc.
InventorsKarthik Janakiraman, Hari K. Ponnekanti, Juan Carlos Rocha-Alvarez
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Abstract
A substrate transport system is disclosed and includes a chamber having an interior wall, a planar motor disposed on the interior wall, and a substrate carrier magnetically coupled to the planar motor. The substrate carrier comprises a base and a substrate supporting surface coupled to a support member extending from the base in a cantilevered orientation.
Claims19
A substrate transport system, comprising:
- a chamber having an interior wall;
- a planar motor disposed on the interior wall;
- a substrate carrier magnetically coupled to the planar motor, the substrate carrier comprising:
- a base;
- a substrate supporting surface coupled to a support member extending from the base in a cantilevered orientation;
- and
- an electrically conductive plate to apply radio frequency power to the chamber.
4 more elements
A system for processing a substrate, comprising:
- a process chamber positioned at a first level and extending between a pair of elevators;
- a return chamber coupled to the pair of elevators at a second level different than the first level;
- and
- a plurality of substrate carriers configured to magnetically couple to an interior wall of each of the process chamber, the elevators and the return chamber, and adapted to move into and out of the process chamber, wherein the interior wall comprises a plurality of electromagnetic coils, wherein each of the plurality of substrate carriers comprise:
- a base;
- a substrate supporting surface coupled to a support member extending from the base in a cantilevered manner;
- and
- a radio frequency electrode.
5 more elements
A system for processing a substrate, comprising:
- a plurality of elevators extending in a first direction;
- a first processing rack extending in a second direction that is orthogonal to the first direction;
- and
- a second processing rack extending in the second direction and substantially parallel to the first processing rack, wherein a service space is provided between the first processing rack and the second processing rack, and wherein each of the processing racks comprise:
- one or more process chambers operably coupled to the plurality of elevators;
- a return chamber operably coupled to the plurality of elevators;
- and
- a plurality of substrate carriers configured to magnetically couple to an interior wall of each of the process chambers, the elevators and the return chamber and adapted to move into and out of the process chambers, wherein each of the plurality of substrate carriers comprise:
- a base;
- and
- a substrate supporting surface coupled to a support member extending from the base in a cantilevered manner;
- and
- an electrically conductive plate to apply radio frequency power to one of the one or more process chambers.
10 more elements
Dependencies are inferred from the claim text.