Evaluation method, correction method, recording medium and electron beam lithography system

A recording medium storing a program causing a controller for an electron beam lithography system including an aperture formed with multiple openings to execute:

• forming a first evaluation pattern based on first evaluation data using multiple electron beams generated by an electron beam that has passed through the aperture;
• dividing the aperture into multiple regions, each of the multiple regions including a subset of the multiple openings that is less than all the multiple openings in the aperture, and defining the multiple divided regions;
• forming a second evaluation pattern based on second evaluation data using a third evaluation pattern formed by multiple electron beams that have passed through a first divided region among the multiple divided regions;
• comparing the first evaluation pattern with the second evaluation pattern;
• and
• evaluating a precision of the aperture based on a comparison result between the first evaluation pattern and the second evaluation pattern.

An electron beam lithography system comprising an aperture formed with multiple openings, and forming a pattern on a sample, the system comprising:

• a memory storing a program;
• and
• a controller executing the program stored in the memory,
• wherein the program is to execute:
• forming a first evaluation pattern based on first evaluation data using multiple electron beams generated by an electron beam that has passed through the aperture;
• dividing the aperture into multiple regions, each of the multiple regions including a subset of the multiple openings that is less than all the multiple openings in the aperture, and defining the multiple divided regions;
• forming a second evaluation pattern based on second evaluation data using a third evaluation pattern formed by multiple electron beams that have passed through a first divided region among the multiple divided regions;
• comparing the first evaluation pattern with the second evaluation pattern;
• and
• evaluating the precision of the aperture based on the comparison result between the first evaluation pattern and the second evaluation pattern.