Topography simulation apparatus, topography simulation method, and topography simulation program

A non-transitory computer-readable storage medium storing instructions as a topography simulation program executable by a processor to:

• input two-dimensional data indicating a layout of a pattern into a memory;
• set topographies of a material at N times T1 to TN within a calculation region, N being an integer of two or more;
• develop the topographies of the material at the times T1 to TN over time independently, and calculate first to N-th values respectively representing a change in topography of the material from the times T1 to TN to times T1′ to TN′;
• and
• calculate a topography of the material at time TN+1, based on the first to N-th values,
• wherein the topography of material at the time Ti (i=2. . . N) is developed before, after, or during the development of the topography of the material at the time Ti−1.

A topography simulation method comprising:

• inputting two-dimensional data indicating a layout of a pattern into a memory;
• setting topographies of a material at N times T1 to TN within a calculation region, wherein N is an integer of two or more;
• developing the topographies of the material at the times T1 to TN over time independently;
• calculating first to N-th surface movement amounts of the material from the times T1 to TN to times T1′ to TN′, respectively;
• and
• calculating a topography of the material at time TN+1, based on the first to Nth surface movement amounts,
• wherein the topography of the material at the time Ti (i=2 , . . . , N) is developed before, after, or during the development of the topography of the material at the time Ti−1.