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US 10,481,508 B2Granted
Exposure apparatus and method of manufacturing article
AssigneeCanon Kabushiki Kaisha
InventorTakanori Sato
Life of this patent
Estimating the term…
Abstract
The present invention provides an exposure apparatus which transfers a pattern of a mask onto a substrate by exposing the substrate while scanning the mask and the substrate, the apparatus including a stage configured to hold the substrate and move, a control unit configured to control movement of the stage, a first measurement unit configured to measure a position, in a height direction, of a shot region of the substrate held by the stage before the shot region reaches an exposure area where the shot region is exposed, and a second measurement unit configured to measure the position of the shot region in the height direction prior to the first measurement unit.
Claims11
An exposure apparatus for transferring a pattern of a mask onto a substrate by exposing the substrate while scanning the mask and the substrate, the apparatus comprising:
- a stage configured to hold and move the substrate;
- a control unit configured to control movement of the stage;
- a first measurement unit configured to measure a position, in a height direction, of a shot region of the substrate held by the stage before the shot region reaches an exposure area where the shot region is exposed;
- and
- a second measurement unit configured to measure the position of the shot region in the height direction prior to the first measurement unit,
- wherein the control unit:
- controls the stage to perform:
- first driving where the substrate is driven in the height direction based on a measurement result of the second measurement unit;
- and
- second driving where the substrate is driven in the height direction based on a measurement result of the first measurement unit after the second measurement unit measures the position of the shot region in the height direction and until the shot region reaches the exposure area;
- makes a second driving amount of the stage in the height direction in the second driving smaller than a first driving amount of the stage in the height direction in the first driving;
- controls the stage so that the position of the shot region in the height direction is positioned at a first target position different from a second target position of the shot region in the height direction by the first driving and is positioned at the second target position by the second driving;
- and
- makes a time period required for the first driving from the position of the shot region in the height direction measured by the second measurement unit to the first target position shorter than a time period required for the second driving from the position of the shot region in the height direction measured by the first measurement unit to the second target position.
11 more elements
A method of manufacturing an article, the method comprising the steps of:
- forming a pattern on a substrate using an exposure apparatus;
- and
- developing the exposed substrate to manufacture the article,
- wherein the exposure apparatus transfers a pattern of a mask onto the substrate by exposing the substrate while scanning the mask and the substrate, and includes:
- a stage configured to hold and move the substrate;
- a control unit configured to control movement of the stage;
- a first measurement unit configured to measure a position, in a height direction, of a shot region of the substrate held by the stage before the shot region reaches an exposure area where the shot region is exposed;
- and
- a second measurement unit configured to measure the position of the shot region in the height direction prior to the first measurement unit,
- wherein the control unit:
- controls the stage to perform:
- first driving where the substrate is driven in the height direction based on a measurement result of the second measurement unit;
- and
- second driving where the substrate is driven in the height direction based on a measurement result of the first measurement unit after the second measurement unit measures the position of the shot region in the height direction and until the shot region reaches the exposure area;
- makes a second driving amount of the stage in the height direction in the second driving smaller than a first driving amount of the stage in the height direction in the first driving;
- controls the stage so that the position of the shot region in the height direction is positioned at a first target position different from a second target position of the shot region in the height direction by the first driving and is positioned at the second target position by the second driving;
- and
- makes a time period required for the first driving from the position of the shot region in the height direction measured by the second measurement unit to the first target position shorter than a time period required for the second driving from the position of the shot region in the height direction measured by the first measurement unit to the second target position.
15 more elements
An exposure apparatus for transferring a pattern of a mask onto a substrate by exposing the substrate, the apparatus comprising:
- a stage configured to hold and move the substrate;
- a control unit configured to control movement of the stage;
- a first measurement unit configured to measure a position, in a height direction, of a shot region of the substrate held by the stage before the shot region reaches an exposure area where the shot region is exposed;
- and
- a second measurement unit configured to measure the position of the shot region in the height direction prior to the first measurement unit,
- wherein the control unit:
- controls the stage to perform:
- first driving where the substrate is driven in the height direction based on a measurement result of the second measurement unit;
- and
- second driving where the substrate is driven in the height direction based on a measurement result of the first measurement unit after the second measurement unit measures the position of the shot region in the height direction and until the shot region reaches the exposure area;
- makes a second driving amount of the stage in the height direction in the second driving smaller than a first driving amount of the stage in the height direction in the first driving;
- controls the stage so that the position of the shot region in the height direction is positioned at a first target position different from a second target position of the shot region in the height direction by the first driving and is positioned at the second target position by the second driving;
- and
- makes a time period required for the first driving from the position of the shot region in the height direction measured by the second measurement unit to the first target position shorter than a time period required for the second driving from the position of the shot region in the height direction measured by the first measurement unit to the second target position.
11 more elements
A method of manufacturing an article, the method comprising the steps of:
- forming a pattern on a substrate using an exposure apparatus;
- and
- developing the exposed substrate to manufacture the article,
- wherein the exposure apparatus transfers a pattern of a mask onto the substrate by exposing the substrate, and includes:
- a stage configured to hold and move the substrate;
- a control unit configured to control movement of the stage;
- a first measurement unit configured to measure a position, in a height direction, of a shot region of the substrate held by the stage before the shot region reaches an exposure area where the shot region is exposed;
- and
- a second measurement unit configured to measure the position of the shot region in the height direction prior to the first measurement unit,
- wherein the control unit:
- controls the stage to perform:
- first driving where the substrate is driven in the height direction based on a measurement result of the second measurement unit;
- and
- second driving where the substrate is driven in the height direction based on a measurement result of the first measurement unit after the second measurement unit measures the position of the shot region in the height direction and until the shot region reaches the exposure area;
- makes a second driving amount of the stage in the height direction in the second driving smaller than a first driving amount of the stage in the height direction in the first driving;
- controls the stage so that the position of the shot region in the height direction is positioned at a first target position different from a second target position of the shot region in the height direction by the first driving and is positioned at the second target position by the second driving;
- and
- makes a time period required for the first driving from the position of the shot region in the height direction measured by the second measurement unit to the first target position shorter than a time period required for the second driving from the position of the shot region in the height direction measured by the first measurement unit to the second target position.
15 more elements
Dependencies are inferred from the claim text.