Coating compositions for use with an overcoated photoresist
AssigneeRohm and Haas Electronic Materials LLC
InventorsVipul Jain, Owendi Ongayi, Suzanne Coley, Anthony Zampini
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Abstract
Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a component that comprises one or more parabanic acid moieties. Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.
Claims12
A coated substrate comprising:
- (a) a layer of a coating composition on a substrate, the coating composition comprising a polyester resin that comprises 1) one or more polymerized parabanic diacetate groups and 2) one or more cyanurate groups;
- and
- (b) a photoresist layer over the coating composition layer.
A method of forming a photoresist relief image, comprising:
- (a) applying a coating composition on a substrate, the coating composition comprising polyester resin that comprises 1) one or more polymerized parabanic diacetate groups and 2) one or more cyanurate groups;
- (b) applying a photoresist composition above the coating composition layer;
- and
- (c) exposing and developing the photoresist layer to provide a resist relief image.
An antireflective composition for use with an overcoated photoresist composition, the antireflective composition comprising a polyester resin that comprises 1) one or more parabanic acid moieties and 2) one or more polymerized tris(hydroxyl ethyl)isocyanurate groups.
Dependencies are inferred from the claim text.