Fluid droplet methodology and apparatus for imprint lithography
AssigneeCanon Kabushiki Kaisha
InventorsEdward Brian Fletcher, Timothy Brian Stachowiak
Life of this patent
Estimating the term…
Loading patent…
AssigneeCanon Kabushiki Kaisha
InventorsEdward Brian Fletcher, Timothy Brian Stachowiak
Estimating the term…
A method can be used to generate a fluid droplet pattern for an imprint lithography process using a fluid dispense system having fluid dispense ports. The method can include determining a fluid droplet pattern for dispensing a formable material onto a substrate; during a first pass, dispensing the formable material onto the substrate to form a first part of the fluid droplet pattern for an imprint field; offsetting the fluid dispense ports and substrate relative to each other in an offset direction; and during a second pass, dispensing the formable material onto the substrate to form a second part of the fluid droplet pattern for the imprint field. The method can be used to form a patterned layer over a semiconductor wafer in fabricating an electronic device. An apparatus can be configured to carry out the method.
A method of generating a fluid droplet pattern for an imprint lithography process, the method comprising:
A method of manufacturing an article, the method comprising:
Dependencies are inferred from the claim text.