Method for manufacturing color filter substrate, color filter substrate and display panel

A method for manufacturing a color filter substrate, comprising:

• forming a color resistance layer on a basal substrate;
• forming a conversion layer on the basal substrate with the color resistance layer, wherein the conversion layer includes a first conversion sub-layer that absolutely overlaps with the color resistance layer and a second conversion sub-layer that does not overlap with the color resistance layer;
• wherein the thickness of the second conversion sub-layer is greater than the thickness of the color resistance layer and the conversion layer is convertible in color under the irradiation of preset light rays;
• wherein the conversion layer is manufactured by an opaque material;
• and
• irradiating the conversion layer with the preset light rays from the side of the conversion layer away from the basal substrate and controlling irradiation parameters of the preset light rays, so that the film layer at the side of the conversion layer away from the basal substrate is converted to an opaque first over cover sub-layer, and the film layer with a first preset thickness of the second conversion sub-layer at the side of the conversion layer away from the basal substrate is converted to an opaque second over cover sub-layer, the conversion layer is converted to a two-layer structure consisting of a black matrix (BM) pattern and a transparent over cover layer, wherein the over cover layer includes the first over cover sub-layer and the second over cover sub-layer, wherein the first preset thickness is greater than a difference value between the thickness of the second over cover sub-layer and the thickness of the color resistance layer;
• wherein the conversion layer contains a photocatalyst for enabling a portion of the conversion layer irradiated by the preset light rays to convert to a transparent state;
• wherein the BM pattern is disposed at the side of the conversion layer close to the basal substrate.