Plasma enhanced chemical vapor deposition apparatus that includes conductive mask supports

A plasma enhanced chemical vapor deposition (PECVD) apparatus, comprising:

• a chamber;
• an upper electrode in the chamber;
• a spray unit in the upper electrode to spray a gas introduced from outside the chamber toward a substrate inside the chamber;
• a susceptor on which the substrate is mountable;
• a plurality of mask supports in a mask frame at an edge of the susceptor;
• and
• a power supply unit to supply power to the upper electrode,
• wherein each mask support includes:
• a body insertedly installed in the mask frame;
• a conductive member insertedly installed in the body, the conductive member contacting and supporting the mask;
• an elastic member supporting the conductive member, the elastic member having elasticity;
• and
• a fixing member under the elastic member to support the conductive member, the fixing member being fixed to the body to prevent the conductive member and the elastic member from being separated from the body.