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US 10,480,075 B2Granted
Graphene synthesis chamber and method of synthesizing graphene by using the same
AssigneesNPS Corporation, Hanwha Aerospace Co., Ltd.
InventorsDong-kwan Won, Won-Sik Nam
Life of this patent
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Abstract
A graphene synthesis chamber includes: a chamber case in which a substrate including a metal thin film is placed; a gas supply unit which supplies at least one gas comprising a carbon gas into an inner space of the chamber case; a main heating unit which emits at least one light to the inner space to heat the substrate; and at least one auxiliary heating unit which absorbs the at least one light and emits radiant heat toward the substrate.
Claims7
A graphene synthesis method comprising:
- disposing a substrate including a metal thin film in an inner space of a graphene synthesis chamber;
- depressurizing the inner space;
- supplying a gas including carbon into the inner space;
- and
- irradiating a light to the inner space to heat the substrate using a main heating unit,
- wherein an auxiliary heating unit comprising a graphite which absorbs the light emitted by the main heating unit, and emit radiant heat toward the substrate is disposed between the main heating unit and the substrate,
- wherein the auxiliary heating unit comprises a first auxiliary heating unit which faces a first surface of the substrate, and a second auxiliary heating unit which faces a second surface, opposite to the first surface, of the substrate,
- wherein each of the first auxiliary heating unit and the second auxiliary heating unit is spaced apart from the substrate,
- wherein the main heating unit comprises a first main heating unit and a second main heating unit, and
- wherein the first auxiliary heating unit is disposed between the first main heating unit and the substrate, and the second auxiliary heating unit is disposed between the second main heating unit and the substrate.
7 more elements
Dependencies are inferred from the claim text.