Rotating semi-batch ALD device

A rotating semi-batch ALD device, comprising:

• a vacuum container,
• a rotating susceptor,
• a plurality of substrates being processed disposed on the susceptor,
• a substrate heating heater,
• a plurality of substantially sector-shaped reaction gas supply means disposed in an upper portion of the vacuum container,
• a plurality of separate purge gas supply means disposed between the plurality of substantially sector-shaped reaction gas supply means, and
• a vacuum evacuation means provided as an independent separate system for each reaction gas,
• wherein
• the rotating semi-batch ALD device repeatedly exposes the substrates to the reaction gas sequentially by rotating the susceptor to perform an ALD deposition,
• an entire circumference of each reaction gas supply means is surrounded by a different one of a plurality of first vacuum evacuation grooves as first parts of the vacuum evacuation means, and
• an entire circumference of each of the plurality of separate purge gas supply means is surrounded by a different one of a plurality of separate second vacuum evacuation grooves as second parts of the vacuum evacuation means.