Storage device, vaporizer and substrate processing apparatus

A vaporizer comprising:

• a storage device comprising:
• a sidewall formed in a cylindrical shape;
• a cover wall disposed at an upper end of the sidewall;
• a bottom wall connected to a lower end of the sidewall and comprising a mounting surface mountable on a weight detector;
• a storage chamber surrounded by the sidewall, the cover wall, and the bottom wall;
• a recess communicating with the storage chamber and provided at the bottom wall;
• a communication pipe comprising an upstream portion connected directly to a bottom portion of the recess and extending in a vertically downward direction with a diameter smaller than that of the recess, a downstream portion extending in a vertically upward direction in the bottom wall, and a middle portion disposed between the upstream portion and the downstream portion;
• a gas flow path provided at a wall other than the bottom wall;
• and
• a discharge pipe connected directly to the downstream portion of the communication pipe and extending in a direction same as that of the downstream portion of the communication pipe with a diameter smaller than that of the downstream portion of the communication pipe;
• and
• a heater configured to heat the storage chamber.

A substrate processing apparatus comprising:

• a vaporizer comprising:
• a storage device comprising:
• a sidewall formed in a cylindrical shape;
• a cover wall disposed at an upper end of the sidewall;
• a bottom wall connected to a lower end of the sidewall and comprising a mounting surface mountable on a weight detector;
• a storage chamber surrounded by the sidewall, the cover wall, and the bottom wall;
• a recess communicating with the storage chamber and provided at the bottom wall,
• a communication pipe comprising an upstream portion connected directly to a bottom portion of the recess and extending in a vertically downward direction with a diameter smaller than that of the recess, a downstream portion extending in a vertically upward direction in the bottom wall, and a middle portion disposed between the upstream portion and the downstream portion,
• a gas flow path provided at a wall other than the bottom wall;
• and
• a discharge pipe connected directly to the downstream portion of the communication pipe and extending in a direction same as that of the downstream portion of the communication pipe with a diameter smaller than that of the downstream portion of the communication pipe;
• and
• a heater configured to heat the storage chamber;
• a process chamber communicating with the vaporizer;
• and
• a substrate support configured to support a substrate inside the process chamber.