Gas distribution for chemical vapor deposition/infiltration

A gas distribution plate for a chemical vapor deposition/infiltration system, the gas distribution plate comprising:

• a body comprising a first side and a second side opposite the first side, wherein the body is hollow and defines an internal cavity;
• a plurality of pass-through tubes extending through the internal cavity, wherein each pass-through tube of the plurality of pass-through tubes extends from a first opening defined in the first side of the body to a second opening defined in the second side, wherein a reaction gas is configured to flow through the plurality of pass-through tubes;
• and
• a cavity inlet defined in the first side of the body, wherein a gaseous mitigation agent is configured to flow into the internal cavity of the body via the cavity inlet;
• and
• a plurality of cavity outlets defined in the second side of the body, wherein the gaseous mitigation agent is configured flow out the internal cavity via the plurality of cavity outlets;
• wherein the body comprises a conical distribution feature having a base and an apex, wherein the base is flush with and extends from the second side of the body and the apex protrudes into the internal cavity directly opposite the cavity inlet.