Metal fill optimization for self-aligned double patterning
AssigneeInternational Business Machines Corporation
InventorsAlbert M. Chu, Lawrence A. Clevenger, Ximeng Guan, Myung-Hee Na
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Abstract
A technique relates to a method of optimizing self-aligned double patterning. Predefined locations for required metal cuts are provided in order to form metal wires from metal fills that have been cut. Extended locations for extended metal cuts are provided in order to cut adjacent metal fills. The adjacent metal fills are the metal fills that are adjacent to the predefined locations for the required metal cuts, and the extended metal cuts extend beyond the required metal cuts. The required metal cuts into the metal fills are performed and the extended metal cuts into the adjacent metal fills are performed.
Claims20
A method of optimizing self-aligned double patterning, the method comprising:
- providing predefined locations for required metal cuts in order to form metal wires from metal fills that have been cut, the metal wires having a priority;
- providing extended locations for extended metal cuts in order to cut adjacent metal fills, the adjacent metal fills being the metal fills that are adjacent to the predefined locations for the required metal cuts, wherein the extended metal cuts extend beyond the required metal cuts, wherein the metal wires having a higher priority are associated with a higher likelihood of having the extended metal cuts as compared to the metal wires having a lower priority;
- and
- performing the required metal cuts into the metal fills and the extended metal cuts into the adjacent metal fills.
A structure formed by self-aligned double patterning, the structure comprising:
- wire metals formed by cutting metal fills to form required metal cuts, the metal wires having a priority;
- and
- adjacent metal fills of the metal fills, the adjacent metal fills including extended cuts, wherein the extended cuts are aligned to the required metal cuts, wherein the required metal cuts and the extended cuts are spaces of removed metal from the metal fills, wherein the metal wires having a higher priority are associated with a higher likelihood of having the extended metal cuts as compared to the metal wires having a lower priority.
A computer program product of a design for optimizing self-aligned double patterning, the computer program product comprising a computer readable storage medium having program instructions embodied therewith, wherein the computer readable storage medium is not a transitory signal per se, the program instructions readable by a computer to cause the computer to perform a method comprising:
- providing predefined locations for required metal cuts in order to form metal wires from metal fills that have been cut, the metal wires having a priority;
- providing extended locations for extended metal cuts in order to cut adjacent metal fills, the adjacent metal fills being the metal fills that are adjacent to the predefined locations for the required metal cuts, wherein the extended metal cuts extend beyond the required metal cuts, wherein the metal wires having a higher priority are associated with a higher likelihood of having the extended metal cuts as compared to the metal wires having a lower priority;
- and
- causing fabrication equipment to perform the required metal cuts into the metal fills and the extended metal cuts into the adjacent metal fills.
Dependencies are inferred from the claim text.