Temperature control apparatus, temperature control method and recording medium
AssigneeTokyo Electron Limited
InventorsDaisuke Hayashi, Masato Takayama
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AssigneeTokyo Electron Limited
InventorsDaisuke Hayashi, Masato Takayama
Estimating the term…
A processing system includes a thermo viewer 51 which measures a temperature distribution over a top surface of a semiconductor wafer; a temperature measuring device 14 which measures, for each of divided areas of the semiconductor wafer, a temperature of a portion in the divided area; a median value calculating unit 202 which calculates, for each divided area, a median value of a temperature distribution of the divided area, based on the temperature distribution measured by the thermo viewer 51; an offset calculating unit 204 which calculates, for each divided area, a difference between the median value and the temperature of the portion as an offset; and a temperature control unit 205 which controls, for each divided area, the temperature of the divided area such that the median value becomes equal to a set temperature, based on the offset and the temperature measured by the temperature measuring device 14.
A temperature control apparatus of controlling a temperature of a processing target object, the temperature control apparatus comprising:
A temperature control method of controlling a temperature of a processing target object, the temperature control method comprising:
A temperature control apparatus of controlling a temperature of a processing target object, the temperature control apparatus comprising:
Dependencies are inferred from the claim text.