Method and apparatus to reduce the leakage rate of a hermetic cavity
AssigneeTexas Instruments Incorporated
InventorsJuan Herbsommer, Benjamin Cook, S. Josh Jacobs
Life of this patent
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AssigneeTexas Instruments Incorporated
InventorsJuan Herbsommer, Benjamin Cook, S. Josh Jacobs
Estimating the term…
A chip scale vapor cell and millimeter wave atomic clock apparatus are disclosed. The chip scale vapor cell includes a first substrate and a second substrate bonded to the first substrate with a bonding material. A primary hermetic cavity includes a first bottom wall and first sidewalls formed in the first substrate and a first top wall formed by the lower surface of the second substrate. A secondary hermetic cavity includes a second bottom wall and second sidewalls formed in the first substrate and a second top wall formed by the lower surface of the second substrate. The secondary hermetic cavity is separate from the primary hermetic cavity and surrounds the perimeter of the primary hermetic cavity. A gas, which can be a dipolar molecular gas, is sealed in the primary hermetic cavity and the secondary hermetic cavity at a given initial pressure.
A chip scale vapor cell comprising:
A chip scale vapor cell comprising:
A millimeter wave atomic clock apparatus comprising:
Dependencies are inferred from the claim text.