Silicon carbide semiconductor device and method for manufacturing same

A silicon carbide semiconductor device comprising:

• a substrate having a first conductivity type or a second conductivity type and made of silicon carbide;
• a drift layer disposed over the substrate, made of silicon carbide, and having the first conductivity type with an impurity concentration lower than the substrate;
• a base region disposed over the drift layer, made of silicon carbide, and having the second conductivity type;
• a plurality of source regions disposed over an upper layer portion of the base region, made of silicon carbide, and having the first conductivity type with an impurity concentration higher than the drift layer;
• a contact region disposed over the upper layer portion of the base region between opposing source regions, made of silicon carbide, and having the second conductivity type with an impurity concentration higher than the base layer;
• a plurality of trenches disposed from a surface of each source region to a depth deeper than the base region, and arranged in parallel to each other along one direction as a longitudinal direction;
• a gate insulating film arranged on an inner wall of each trench;
• a gate electrode arranged on the gate insulating film in each trench;
• a source electrode electrically connected to the source regions and the contact region;
• a drain electrode arranged over a rear surface of the substrate;
• and
• a plurality of electric field relaxation layers disposed in the drift layer located below the base region, spaced apart from a side of each trench, arranged between adjacent trenches along a direction as a longitudinal direction parallel to the longitudinal direction of the trenches, made of silicon carbide, and having the second conductivity type, wherein:
• each of the plurality of electric field relaxation layers includes:
• a first region that is arranged at a position deeper than the trenches;
• and a second region that is arranged from a surface of the drift layer to the first region and has a uniform impurity concentration;
• a distance between adjacent second regions is defined as W1;
• a distance between adjacent first regions is defined as W2;
• a relationship of “W1>W2” is satisfied;
• a width of a trench gate structure, in which the gate insulating film and the gate electrode are disposed in each of the trenches, is defined as W3;
• and
• a relationship of “W2>W3” is satisfied;
• and
• the second regions have an impurity concentration higher than the base region,
• wherein:
• a portion of the drift layer that is located above the first region surrounds at least a bottom of a trench gate structure and extends across an entire length of the bottom of the trench gate structure, in which the gate insulating film and the gate electrode are disposed in each of the trenches, is a high impurity concentration layer having the impurity concentration of the first conductivity type impurity higher than a remaining portion of the drift layer, and
• the second region has the uniform impurity concentration in a depth direction.