Support ring with masked edge
AssigneeApplied Materials, Inc.
InventorsMehran Behdjat, Norman L. Tam, Aaron Muir Hunter, Joseph M. Ranish, Koji Nakanishi, Toshiyuki Nakagawa
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AssigneeApplied Materials, Inc.
InventorsMehran Behdjat, Norman L. Tam, Aaron Muir Hunter, Joseph M. Ranish, Koji Nakanishi, Toshiyuki Nakagawa
Estimating the term…
A support ring for semiconductor processing is provided. The support ring includes a ring shaped body defined by an inner edge and an outer edge. The inner edge and outer edge are concentric about a central axis. The ring shaped body further includes a first side, a second side, and a raised annular shoulder extending from the first side of the ring shaped body at the inner edge. The support ring also includes a coating on the first side. The coating has an inner region of reduced thickness region abutting the raised annular shoulder.
A support ring for semiconductor processing, comprising:
A support ring for semiconductor processing, comprising:
A support ring for semiconductor processing, comprising:
Dependencies are inferred from the claim text.