Showerhead having an extended detachable gas distribution plate

A showerhead for use in a semiconductor processing chamber, comprising:

• a body having a first side, an opposing second side, and a plurality of through holes to facilitate passage of process gases through the body;
• a gas distribution plate disposed proximate the second side of the body, having a plurality of gas distribution holes formed through the gas distribution plate from a body-facing side to an opposing processing volume-facing side, and an annular groove formed in a side surface of the gas distribution plate;
• and
• a clamp disposed about a peripheral edge of the gas distribution plate to removably couple the gas distribution plate to the body, wherein the clamp includes a body and a protrusion extending radially inward into the annular groove, and wherein a portion of the processing volume-facing side of the gas distribution plate extends over a predominant portion of a bottom surface of the clamp.

A process chamber, comprising:

• a chamber body having a substrate support disposed within an inner volume of the chamber body;
• and
• a showerhead disposed within the inner volume of the chamber body opposite the substrate support, the showerhead comprising:
• a body having a first side and an opposing second side;
• a gas distribution plate disposed proximate the second side of the body and having an annular groove formed in a side surface;
• and
• a clamp disposed about a peripheral edge of the gas distribution plate to removably couple the gas distribution plate to the body, wherein the clamp includes a body and a protrusion extending radially inward into the annular groove, and wherein a lower portion of the gas distribution plate extends over and substantially completely covers a bottom surface of the clamp.