Measurement device and measurement method, exposure apparatus and exposure method, and device manufacturing method

An exposure apparatus that forms a predetermined pattern on an object by irradiating the object with an energy beam, the apparatus comprising:

• a mark detection system that has an irradiation system, an objective optical system and a beam receiving system, the irradiation system irradiating a grating mark provided at the object that is moved in a first direction, with a measurement beam, while scanning the measurement beam in the first direction with respect to the grating mark, the objective optical system including an objective optical element capable of facing the object that is moved in the first direction, and the beam receiving system receiving a diffraction beam from the grating mark of the measurement beam via the objective optical system, wherein
• the objective optical element has a first area in which an optical path of the measurement beam from the irradiation system is provided, and a second area in which an optical component is provided,
• the diffraction beam generated at the grating mark is deflected or diffracted, by the optical component, toward the beam receiving system, and
• a position of the object is controlled on the basis of a detection result of the mark detection system.

A measurement method of measuring positional information of a grating mark provided at an object, the method comprising:

• moving the object in a first direction, below an objective optical system including an objective optical element capable of facing the object;
• irradiating the grating mark of the object that is moved, with a measurement beam, while scanning the measurement beam in the first direction with respect to the grating mark;
• receiving a diffraction beam from the grating mark of the measurement beam with a beam receiving system via the objective optical system;
• and
• obtaining positional information of the grating mark on the basis of an output of the beam receiving system, wherein
• the objective optical system deflects or diffracts the diffraction beam generated at the grating mark, toward the beam receiving system, using an optical component provided in a second area that is different from a first area in which an optical path of the measurement beam is provided.